2016-06-01 23:48
salicide翻译
硅化物
音标读音
英式:[sə'lɪsaɪd]美式:[sə'lɪsaɪd]
基本意思
自对准多晶硅化物
形近的词
变形
例句
- This article describes the process and equipment of salicide in sub-micron process.
文章对亚微米自对准硅化物制造设备及工艺进行了详细的描述。
- As a result, the technology is suitable for very or ultra deep sub-micron CMOS VLSI and even nonameter devices by improving NiSi salicide process.
实验结果表明，本工艺完全适用于超深亚微米CMOS器件甚至纳米器件对硅化物的要求。
- The Research of Ni-SALICIDE Process for the Application to Deep Sub-micron CMOS Devices
适用于深亚微米CMOS器件的Ni自对准硅化物工艺的研究
- The Development of Salicide in Sub-micron Process
亚微米自对准硅化物工艺开发
- As CMOS IC fabrication technology continuously progresses toward nano nodes. The self-aligned silicide ( SALICIDE) material and technology also require corresponding innovations.
随着CMOS集成电路制造技术持续向纳米级工艺推进，与之相应的自对准硅化物（SALICIDE）材料和工艺也在不断的发展创新。
- Thickness measurement of ultra-thin salicide films down to 10 nm has been accurately performed using attenuation of Si substrate Raman signal at 520 cm~ (-1).
运用Si衬底的拉曼信号，超薄硅化物薄膜的厚度（10nm）可以得到非常精确，便利的测量。
- The fabrication of prototype is demonstrated using 0 25 μ m single poly five metal N well salicide CMOS digital process.
该电路已经用0.25μm单层多晶、五层金属N阱CMOS数字工艺制作。
- Due to the limitation of narrow line effect, TiSi_2 is replaced by CoSi_2 in SALICIDE technology at 0.25/ 0.18 μ m node.
由于窄线条效应限制，在0.25/0.18μm技术代SALICIDE工艺使用CoSi2取代TiSi2。
百科解释
网络意思